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Equipment
eeplasma offers 3 designs of the MW-Remote Plasma Source

Equipment_1

Type: eeRG 2000/3000   
Plasma Applicator perpendicular versus MW-launcher

Dimensions: L x W x H; 360 x 360 x 260mm
Equipment_2

Type: eeRG 2000/3000   
Plasma Applicator parallel versus MW-launcher

Dimensions: L x W x H; 480 x 300 x 270mm
Equipment_3

Type: eeRG 2000/3000   
Plasma Applicator with MW compact-head

Dimensions: L x W x H; 360 x 400 x 300mm

Features of the remote plasma sources:

o    Patented design of microwave plasma applicator
o    Quartz plasma tube or optional alumina res. sapphire
o    Water cooled microwave plasma zone
o    Service-friendly exchange of the plasma tube
o    Easy tuning of the plasma source after plasma tube- and magnetron exchange
o    Plasma ignition within the full pressure range without auxiliary equipment  
o    Cooling body with ISO-K 63 interface flanges

Specifications:
Type: eeRG 2000/3000  

o    MW-Power output: max. 2000 / 3000W
o    Frequency: 2,45 GHz
o    Power input: - 4000V, 750mA / -5000V, 900mA
o    Cooling water: min. 3slm / 4slm
o    Plasma Chamber: Quartz, Ceramic, Sapphire
o    Pressure range: 0,06 – 20 Torr
o    Gases: O2, N2, H2, Ar, He, CF4, SF6, Cl2 etc.
o    Interface: ISO-K 63 flange

Logo eeplasma
eeplasma GmbH
Hochstr. 1
82024 Taufkirchen
Tel:     0049 89 61465769
Mob:  0049 1728338658
V24.03en
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